Sample environments

Scattering chamber

Laser interferrometer setup

Capillary rack

Schematic of the sputtering chamber

MBE chamber

A variety of sample environments are available at the beamline. Further sample environments can be accessed via the PETRA3 sample environment group. Please get in contact if any of these are of interest. Users are also encouraged to use their own sample environments. In this case please contact beamline staff to discuss the opportunities.

 

Scattering chamber

  • Minimization of background and air scattering
  • Suitable for diffraction as well as total scattering and PDF analysis, incl. diffuse scattering and 3D-ΔPDF on single crystals, crystal truncation rod (CTR) measurements on surfaces
  • He atmosphere or vacuum
  • Full sample rotation around vertical rotation axis
  • Opening angle ±30°, accessible Qmax ~27 Å at 100 keV
  • Internal beamstop
  • Compatible with other sample environments, e.g. resistive heaters and multi-capillary rack, contact beamline staff about integration of user-specific sample environments

 

Resistive heating plates (Bach heaters)

  • Flat plate silicon nitride heating elements
  • Temperature range up to 1000 °C
  • Heating rate up to 100 K s-1 
  • Horizontal geometry for measurements in grazing incidence or transmission through large samples
  • Vertical geometry with hole/ slit for transmission measurements
  • Different sizes and shapes available

 

Sample stabilization for variable temperature grazing-incidence measurements

  • In situ thermal treatment of thin films e.g. for crystallization
  • Suitable for diffraction as well as total scattering and PDF analysis
  • 3-beam laser interferometer with active feedback on diffractometer motor positions to compensate for thermal expansion
  • Integrated into scattering chamber
  • Heating under vacuum
  • Compatible with resistive heater (Bach heater), temperature range up to 1000 °C, heating rate up to 100 K min-1  

 

Multi-capillary rack

  • Fast sample change at room temperature
  • Suitable for diffraction as well as total scattering and PDF analysis
  • Up to 25 capillaries
  • Capillary diameter up to 2 mm
  • Compatible with scattering chamber

 

Sputtering chamber

  • In situ growth studies of polycrystalline and amorphous thin films
  • Suitable for diffraction as well as total scattering and PDF analysis
  • RF magnetron source
  • Sample size 10 × 10 mm2, target diameter 1”
  • Temperature range up to 800 °C
  • See this paper for more details on the chamber, its development and a PDF case study cooperation with Martin Roelsgaard and Bo B. Iversen, Aarhus University

 

Molecular beam epitaxy (MBE) chamber

  • In situ growth studies of epitaxial thin films
  • Suitable for diffraction
  • Multiple evaporators
  • Complementary analysis by XPS, RHEED
  • See e.g. https://journals.aps.org/prb/abstract/10.1103/PhysRevB.105.045412 for more information on the chamber and scientific application
  • chamber available upon request to and in cooperation with Joachim Wollschlaeger (University of Osnabrueck) and Florian Bertram (DESY), get in touch with beamline staff to initialize contact with the group

 

 

ErUM-Pro

The BMBF funded the project 05K16MP1 MBE chamber titled "Aufbau einer UHV-Kammer zur Herstellung und in-situ Charakterisierung ultradünner epitaktischer Schichtsysteme mittel hochenergetischer Röntgenbeugung" from Univ. Osnabrück.

The BMBF funded the project 05K2019 LUCENT: Neuartige Messzellen zur Untersuchung photoaktiver Nanomaterialien durch Hochenergie-Röntgenstrahl Streumethoden." Teilprojekt 1 & 2, Universität Hamburg & Ludwig-Maximilians-Universität München.
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