P06 - Micro and Nano-Probe Beamline
GENERAL SPECIFICATIONS
techniques available |
micro-XRF, micro-XRD, micro-XAS |
---|---|
photon source |
undulator |
period number of periods max power |
31.4 mm; 60 3.8 kW |
source brilliance |
1019 ph / s / 0.1% bw / mA |
polarization available |
linear horizontal |
energy range |
5 – 45 keV |
beamline energy resolution |
1.4 x10-4 dE/E for Si (111) |
max flux ON SAMPLE |
2x10^10ph/s in KB mirror focus |
spot size ON SAMPLE |
80nm x80nm (Nanohutch, NFL, 10-25keV) 350nm x350nm (Microhutch, KB mirrors, 5-23keV)
500nm x 1500nm (Microhutch, CRL, 10-50keV) |
angle of incidence light – sample |
0 to 90 |
sample type |
solid or liquid |
Beamsize and flux at sample:
Nanoprobe: |
80 x 80 nm2 some 107 ph/s (Nano Focusing lenses (NFL) 10-25 keV) |
Microprobe: |
350 x 350 nm2 some 1010 ph/s (KB mirrors, 5-23 keV) |
Source properties
Source size: |
36 x 6 µm2 σ (@12keV) |
Source divergence: |
28 x 4 µrad2 σ (@12keV) |
Transverse coherence length: |
ξh ~87mm, ξv ~567mm (@ 100 m and 12keV) |
Linear polarization: |
99.98 % |
Insertion device: |
2m Spectroscopy undulator U32, Period length = 31.4 mm, Minimum gap 9.5 mm, first harmonic 2.4 keV |
OPTICS
type |
cryo cooled double crystal monochromator (DCM) and cryo cooled channel-cut monochromator (CC) |
---|---|
grating properties |
Si (111) (DCM and CC) |
energy range |
Si111 DCM 2.4-50keV, Si111 CC 6-20 keV |
resolving power |
Si:1.4x10-4 dE/E |
Double-crystal Monochromator (Oxford High-heatload DCM)
Crystals: |
Si(111) pair and Channel-cut |
Energy range: |
2.4 – 50 keV (DCM), 6 -20 keV (CC) |
Double plane mirrors (Zeiss) |
for higher harmonics rejection, optional |
Coating: |
Cr, Si, Pt |
Energy range: |
4-42 keV |
Due to diamond windows and ambient sample environment the lowest feasible beam energy is currently limited to 6 keV.
ENDSTATION(S)
Diffractometer |
n.a. |
---|---|
Manipulator |
x,y,z stages and 1 rotation |
Sample environment |
atmosphere |
pressure range |
none |
---|---|
temperature range |
none |
humidity range |
none |
Transmission |
yes |
---|---|
Reflection |
yes |
Fluorescence |
yes |
Total electron yield |
No |
Grazing incidence angle |
n.a. |
Type |
Vortex | PCO edge | Eiger 4M |
---|---|---|---|
energy resolution |
140eV FWHM |
none | none |
count rate |
1Mcps |
|
5x10^8 ph/s/mm^2 |
spatial resolution |
n.a. | 1µm | 75 µm |
angular resolution |
n.a. | n.a. | |
2theta range |
n.a. |
|
|
read-out time |
0.25µs | 5ms | 4 µs |
pixel size |
n.a. | 6.5 µm | 75 µm |
array size |
n.a. |
2048 × 2048 pixel |
2070x2167 pixel |
field of view |
50mm2 |
x10: 1.3mm x 1.3mm x25:0.53mm x 0.53mm x50:0.26mm x 0.26mm |
155 x 162 mm^2 |
degrees of freedom / translation stages |
4/ yes |
yes | 3/ yes |
cradles |
n.a. | n.a. | n.a. |
typical collection time |
0.003-5 s | <0.1 s | 0.002 - 2 s |
Imaging mode |
scanning mode |
---|---|
type |
transmission, fluorescence, absorption, diffraction, diffractive imaging, 2D and 3D |
energy resolution |
XRF: 140eV (FWHM), XAS: 1.4 - 4 eV dE/E |
lateral resolution |
Nanoprobe: 80x80nm NFL (10-25 keV) Microprobe: 350x350nm KB Mirror (5-23keV), 500x1500nm CRL (15-35keV) |
field of view |
range 1µm-10mm |
other facilities available: LEED, control atmosphere, mass analyzer, in-situ devices etc.
CONTROL/DATA ANALYSIS
Software type |
Online, TANGO, python, perl |
---|---|
Data output type |
spectra, images |
Data output |
ascii, h5 |
Software(s) for quantitative analysis |
AXIL, PyMCA |
SUPPORT LAB
Sample preparation with optical microscopes.