Beamline information

Optics hutch
Schematic layout of optical components:
HHL: High Heat Load monochromator Si111
BPM: Beam Position Monitor
LOM: Large Offset Monochromator (Si311, Si511)

Experimental hutch
Schematic layout of experimental hutch:
FS: Fast Shutter
SL: Slits (h + v)
CRL: Compound Refractive Lenses

Insertion device:

U29 - 2m

Beta-section:

high

Source size:

142 µm (h) x 5.2 µm (v)

Divergence:

8.7 µrad (h) x 5.5 µrad (v)

Energy range:

5.4 keV to 29.4 keV

High Heat Load (HHL) Monochromator:

Si 111

Large Offset Monochromator (LOM):

Si 311 (5.4 keV - 18.4 keV, dE/E=0.0004)
Si 511 (8.4 keV - 29.4 keV, dE/E=0.0002)

Operation modes:

 

Flux

Beamsize (hor × ver)

Divergence (hor × ver)

Energy resolution

Raw-Mode

2·1012 cts/sec

1300 × 800 µm2

20 × 13 μrad2

5·10-5 bandwidth

Collimation-Mode

1.5·1012 cts/sec

700 × 400 µm2

10 × 2 μrad2

1·10-5 bandwidth

Focusing-Mode

1·1012 cts/sec

300 × 20 µm2

20 × 13 μrad2

5·10-5 bandwidth

µ-Mode

4·1011 cts/sec

30 × 2 µm2

400 × 300 μrad2

1...5·10-5 bandwidth
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application/pdf Beamline layout (as vector graphics) (76KB)