P03 is the microfocus small- and wide-angle X-ray scattering beamline (MiNaXS) at PETRA III. This beamline exploits the excellent photon beam properties of the low emittance source PETRA III to provide micro- and nanofocused beams with ultra-high intensity and resolution in real and reciprocal space. The MiNaXS beamline exploits one of a high-β canted 2 m undulator pairs. The energy range of the beamline is 7 – 21 keV. In combination with Si(111) crystals, this demands a very high stability and precise positioning. To suppress higher harmonics, a planar double-mirror with low incidence angle compatible with the large energy range of the beamline is used. Among the novel methods that exploit perfectly the most-brilliant beam, are μGISAXS [S.V. Roth et al., Appl. Phys. Lett. 88, 021910 (2006)] and μSAXS tomography [C. Schroer et al., Appl. Phys. Lett. 88 (2006) 164102], as well as their expansion to nanosized beams [S. V. Roth et al., Appl. Phys. Lett. 91, 091915 (2007)]. Optics for nanofocusing include KB-mirror, waveguides, and compound refractive lenses. The beamline offers dedicated micro- and nano-focus endstations being both dedicated to transmission as well as grazing incidence experiments. The details of the two end stations are as follows:
- The microfocus end station (hutch EH1) is fully operational and in full user operation. Its beam dimensions are 42 x 20 μm2 and 22 x 13 μm2, which corresponds perfectly with the design values. In 2012, an even smaller microfocus (projected beam size 7 x 4 μm2) was brought into operation.
- Additionally, a 1:1 imaging layout for combining USAXS (Ultra Small-Angle X-ray Scattering) with a moderately microfocused beam is possible.
- A variety of sample environments is offered at the microfocus end station, ranging from imaging ellipsometry to spray coating [Topical Review: S.V. Roth, J. Phys.: Condens. Matter 28, 403003 (2016)] , microfluidics and sputter deposition.
- The Nanofocus Endstation (hutch EH2) is fully operational and in user operation. It was constructed within a BMBF-funded project by Kiel University (Prof. Martin Müller), is now operated by Helmholtz-Zentrum Geesthacht in cooperation with Kiel University and DESY. The minimum beam size is currently 250 nm by 350 nm and a long focal distance optics is used to provide a clear working distance of up to 8 cm.
- The experimental techniques at the Nanofocus Endstation have a strong focus on materials science and the long working distance is an excellent setting for extended in situ sample environments (such as high pressure, nanoindentation, tension, electric / magnetic fields).
For further documentation of the MiNaXS beamline, please refer to Beamline Manual (Login required, please contact the beamline staff)
Please note:
- microfocus end station (EH1): User proposals are accepted via the DOOR system.
- nanofocus end station (EH2): User proposals are accepted via the DOOR system. Prior to submission please contact Christina Krywka or Martin Müller.
- In case of questions and requirements for your next beam time, please contact us in due time to prepare the experiments: minaxscontact@desy.de You will be contacted by the corresponding local contact.
For referencing the beamline P03 in publications, please refer to "Referencing P03"
| CONTACT |
|
GENERAL SPECIFICATIONS
|
techniques available |
[automatic] |
|---|---|
|
photon source |
undulator |
|
period number of periods max power |
29 mm; 66 7.5 kW |
|
source brilliance |
1018 ph / s / 0.1% bw / mA |
|
polarization available |
linear horizontal |
|
energy range |
7 keV – 21 keV |
|
beamline energy resolution |
2 eV at 10 keV |
|
max flux ON SAMPLE |
5 1011 ph /s at 13 keV |
|
spot size ON SAMPLE |
40μm x 20 μm to 0.25 μm x 0.35 μm
|
|
angle of incidence light – sample |
0 to 90 |
|
sample type |
solid or liquid |
OPTICS
|
type |
crystal monochromator |
|---|---|
|
Reflection geometry |
Si(111) |
| energy range |
7-21keV |
| resolving power |
2x10^-4 |
|
type |
CRL (Be) |
|---|---|
|
Radius of curvature |
0.2mm |
| Number |
2x63 |
|
type |
KB mirror |
|---|---|
| Beam size |
down to 250nm x 350nm |
ENDSTATION(S)
|
microfocus end station EH1 |
Beam size 40µmx20µm down to 7µmx4µm |
|---|---|
|
Nanofocus end station EH2 |
Beam size 1.5µmx1.5µm down to 0.25µmx0.35µm |
SAMPLE ENVIRONMENT
|
Hexapod |
Load <30kg , 6 degrees of freedom+Rotation |
|---|---|
|
HUBER Goniometer |
Load <180kg, x/y/z+ 2xtilt stages custom designed for GISAXS |
|
Sputter chamber |
RF, automated, UVVis |
| Tensile Rig |
automated mechanical deformation up to 500N, for grazing incidence and transmission, heating option up to 150°C |
|
Hexapods |
Loads 0.5kg, 2kg, 10kg; each with 6 degrees of freedom (linear pos. accuracy down to 200nm; rotation pos. accuracy down to 3.6 µrad) |
|---|---|
|
Nanopositioning stage |
Load 1 kg, linear pos. accuracy 10nm |
|
Rotation stage |
Load 2 kg, full 360° rotation, pos. accuracy 15 µrad |
|
Customized sample environments |
hydrostatic high pressure; nanoindenter; laminar flow cryocooler; E/B field stages; µfluidics |
TECHNIQUES
|
Transmission SAXS/WAXS |
yes |
|---|---|
|
Reflection |
yes |
|
Fluorescence |
yes |
|
Grazing incidence angle SAXS/WAXS |
yes |
DETECTORS
|
Type |
Pilatus 2M (courtesy of EMBL) |
|---|---|
|
count rate |
10^6 |
|
spatial resolution |
172µm |
|
angular resolution |
depending on setup |
|
2theta range |
depending on setup |
|
read-out time |
2.85 ms |
|
pixel size |
172µm x 172µm |
|
array size |
1475×1679 = 2, 476, 525 pixels |
|
field of view |
254×289 mm² |
|
degrees of freedom / translation stages |
5 x/y/z/Tilt/alpha |
|
cradles |
translation angles |
|
typical collection time |
>40ms |
|
Type |
Photonics Science Imagestar 9000 |
|---|---|
|
count rate |
65 000 |
|
spatial resolution |
69 µm |
|
angular resolution |
depending on setup |
|
2theta range |
depending on setup |
|
read-out time |
2 s (1.0 s - 0.5 s when binned) |
|
pixel size |
12 µm |
|
array size |
3056 x 3056 |
|
field of view |
188 x 188 mm2 |
|
degrees of freedom / translation stages |
5 x/y/z/Tilt/alpha |
|
cradles |
translation angles |
|
typical collection time |
1 s |
|
Type |
Vortex |
|---|---|
|
energy resolution |
140eV FWHM |
|
count rate |
1Mcps |
|
spatial resolution |
n.a. |
|
angular resolution |
depending on setup |
|
2theta range |
n.a. |
|
read-out time |
0.25µs |
|
pixel size |
n.a. |
|
array size |
487x619 |
|
field of view |
50mm2 |
|
degrees of freedom / translation stages |
n.a. |
|
cradles |
n.a. |
|
typical collection time |
1s |
|
Type |
Photodiode in beam stop |
|---|---|
|
count rate |
10^6 |
|
spatial resolution |
n.a. |
|
angular resolution |
depending on setup |
|
2theta range |
n.a. |
|
read-out time |
1ms |
|
pixel size |
1mm |
|
array size |
n.a. |
|
field of view |
1mm2 |
|
degrees of freedom / translation stages |
2 / x/y |
|
cradles |
x/y |
|
typical collection time |
0.1s |
MICROSCOPE
|
Imaging mode |
Reflection |
|---|---|
|
type |
Optical microscope with CCD camera |
|
energy resolution |
n.a. |
|
lateral resolution |
1µm |
|
field of view |
Magnification up to x500, 600µmx500µm |
other facilities available: AFM, imaging ellipsometer, sputter chamber, optical microscope, contact angle apparatus, dip-coating, spray coating, spin coating, µfluidics
CONTROL/DATA ANALYSIS
|
Software type |
Labview, C++, Python |
|---|---|
|
Data output type |
spectra, images, parameters like temperature |
|
Data output |
nxs, tif, cbf, fio |
|
Software(s) for quantitative analysis |
DPDAK (G. Benecke [DESY, MPI Golm], IsGISAXS (R. Lazzari [U Paris]), fitGISAXS (D. Baboneau [U Poitiers]) |
SUPPORT LAB
AFM lab
Sample preparation lab
Mechanics labs
