Sample Preparation

Growth and load lock chambers

(1 x 1) LEED pattern of clean Ir(111) surface

Responsible: Dr. Heshmat Noei

The growth chamber is equipped with Auger, LEED, single and triple metal evaporators, ion source and gas dosing system. Our ultra-high vacuum (UHV) apparatus consists of a tunnel chamber connected to the load-lock, reflection-absorption infrared spectroscopy (RAIRS), X-ray photoelectron spectroscopy (XPS), and scanning probe microscopy (STM/AFM) preparation. This allows carrying out sample cleaning, modification, metal deposition and characterization under UHV without exposing samples to air.

The preparation chamber has the following characteristics:

  • Base pressure of 10-11 mbar
  • Sample heating up to 1500 K
  • Auger
  • LEED
  • Evaporators
  • Sputter gun
  • Oxygen cracking
  • 1 inch Riber sample holder
  • Back pack sample holders for transferring different sample holders to different systems
  • Gas system (Ar, O2, C2H4, CO, H2)