PHOTON SCIENCE

P03 is the microfocus small- and wide-angle X-ray scattering beamline (MiNaXS) at PETRA III. This beamline exploits the excellent photon beam properties of the low emittance source PETRA III to provide micro- and nanofocused beams with ultra-high intensity and resolution in real and reciprocal space. The MiNaXS beamline exploits one of a high-β canted 2 m undulator pairs. The energy range of the beamline is 7 – 21 keV. In combination with Si(111) crystals, this demands a very high stability and precise positioning. To suppress higher harmonics, a planar double-mirror with low incidence angle compatible with the large energy range of the beamline is used. Among the novel methods that exploit perfectly the most-brilliant beam, are μGISAXS [S.V. Roth et al., Appl. Phys. Lett. 88, 021910 (2006)] and μSAXS tomography [C. Schroer et al., Appl. Phys. Lett. 88 (2006) 164102], as well as their expansion to nanosized beams [S. V. Roth et al., Appl. Phys. Lett. 91, 091915 (2007)]. Optics for nanofocusing include KB-mirror, waveguides, and compound refractive lenses. The beamline offers dedicated micro- and nano-focus endstations being both dedicated to transmission as well as grazing incidence experiments. The details of the two end stations are as follows:

• The microfocus end station (hutch EH1) is fully operational and in full user operation. Its beam dimensions are 42 x 20 μm² and 22 x 13 μm², which corresponds perfectly with the design values. In 2012, an even smaller microfocus (projected beam size 7 x 4 μm²) was brought into operation.
• Additionally, a 1:1 imaging layout for combining USAXS (Ultra Small-Angle X-ray Scattering) with a moderately microfocused beam is possible.
• A variety of sample environments is offered at the microfocus end station, ranging from imaging ellipsometry to spray coating [Topical Review: S.V. Roth, J. Phys.: Condens. Matter 28, 403003 (2016)] , microfluidics and sputter deposition.
• The Nanofocus Endstation (hutch EH2) is fully operational and in user operation. It was constructed within a BMBF-funded project by Kiel University (Prof. Martin Müller), is now operated by Helmholtz-Zentrum Geesthacht in cooperation with Kiel University and DESY. The minimum beam size is currently 250 nm by 350 nm and a long focal distance optics is used to provide a clear working distance of up to 8 cm.
• The experimental techniques at the Nanofocus Endstation have a strong focus on materials science and the long working distance is an excellent setting for extended in situ sample environments (such as high pressure, nanoindentation, tension, electric / magnetic fields).

For further documentation of the MiNaXS beamline, please refer to Beamline Manual (Login required, please contact the beamline staff)

 

Please note:

• microfocus end station (EH1): User proposals are accepted via the DOOR system.
• nanofocus end station (EH2): User proposals are accepted via the DOOR system. Prior to submission please contact Christina Krywka or Martin Müller.
• In case of questions and requirements for your next beam time, please contact us in due time to prepare the experiments: minaxscontact@desy.de You will be contacted by the corresponding local contact.

For referencing the beamline P03 in publications, please refer to "Referencing P03"

CONTACT

Sarathlal Koyiloth Vayalil Beamline Scientist in Charge

GENERAL SPECIFICATIONS

techniques available	[automatic]
photon source	undulator
period number of periods max power	29 mm;  66 7.5 kW
source brilliance	1018 ph / s / 0.1% bw / mA
polarization available	linear horizontal
energy range	7 keV – 21 keV
beamline energy resolution	2 eV at 10 keV
max flux ON SAMPLE	5 1011 ph /s at 13 keV
spot size ON SAMPLE	40μm x 20 μm to 0.25 μm x 0.35 μm
angle of incidence light – sample	0 to 90
sample type	solid or liquid

 

OPTICS

type	crystal monochromator
Reflection geometry	Si(111)
energy range	7-21keV
resolving power	2x10^-4

type	CRL (Be)
Radius of curvature	0.2mm
Number	2x63

type	KB mirror
Beam size	down to 250nm x 350nm

 

ENDSTATION(S)

microfocus end station EH1	Beam size 40µmx20µm down to 7µmx4µm
Nanofocus end station EH2	Beam size 1.5µmx1.5µm down to 0.25µmx0.35µm

SAMPLE ENVIRONMENT

Sample environment µfocus end station EH1

Hexapod	Load <30kg , 6 degrees of freedom+Rotation
HUBER Goniometer	Load <180kg, x/y/z+ 2xtilt stages       custom designed for GISAXS
Sputter chamber	RF, automated, UVVis
Tensile Rig	automated mechanical deformation up to 500N, for grazing incidence and transmission, heating option up to 150°C

Sample environment µfocus end station EH2

Hexapods	Loads 0.5kg, 2kg, 10kg; each with 6 degrees of freedom (linear pos. accuracy down to 200nm; rotation pos. accuracy down to 3.6 µrad)
Nanopositioning stage	Load 1 kg, linear pos. accuracy 10nm
Rotation stage	Load 2 kg, full 360° rotation, pos. accuracy 15 µrad
Customized sample environments	hydrostatic high pressure; nanoindenter; laminar flow cryocooler; E/B field stages; µfluidics

TECHNIQUES

Detection modes

Transmission SAXS/WAXS	yes
Reflection	yes
Fluorescence	yes
Grazing incidence angle SAXS/WAXS	yes

DETECTORS

Detector 2D

Type	Pilatus 2M (courtesy of EMBL)
count rate	10^6
spatial resolution	172µm
angular resolution	depending on setup
2theta range	depending on setup
read-out time	2.85 ms
pixel size	172µm x 172µm
array size	1475×1679 = 2, 476, 525 pixels
field of view	254×289 mm²
degrees of freedom / translation stages	5 x/y/z/Tilt/alpha
cradles	translation angles
typical collection time	>40ms

Detector 2D (only EH2)

Type	Photonics Science Imagestar 9000
count rate	65 000
spatial resolution	69 µm
angular resolution	depending on setup
2theta range	depending on setup
read-out time	2 s (1.0 s - 0.5 s when binned)
pixel size	12 µm
array size	3056 x 3056
field of view	188 x 188 mm2
degrees of freedom / translation stages	5 x/y/z/Tilt/alpha
cradles	translation angles
typical collection time	1 s

Detector 0D

Type	Vortex
energy resolution	140eV FWHM
count rate	1Mcps
spatial resolution	n.a.
angular resolution	depending on setup
2theta range	n.a.
read-out time	0.25µs
pixel size	n.a.
array size	487x619
field of view	50mm2
degrees of freedom / translation stages	n.a.
cradles	n.a.
typical collection time	1s

Detector 0D

Type	Photodiode in beam stop
count rate	10^6
spatial resolution	n.a.
angular resolution	depending on setup
2theta range	n.a.
read-out time	1ms
pixel size	1mm
array size	n.a.
field of view	1mm2
degrees of freedom / translation stages	2 / x/y
cradles	x/y
typical collection time	0.1s

MICROSCOPE

Imaging mode	Reflection
type	Optical microscope with CCD camera
energy resolution	n.a.
lateral resolution	1µm
field of view	Magnification up to x500, 600µmx500µm

 

other facilities available: AFM, imaging ellipsometer, sputter chamber, optical microscope, contact angle apparatus, dip-coating, spray coating, spin coating, µfluidics

 

CONTROL/DATA ANALYSIS

Software type	Labview, C++, Python
Data output type	spectra, images, parameters like temperature
Data output	nxs, tif, cbf, fio
Software(s) for quantitative analysis	DPDAK (G. Benecke [DESY, MPI Golm], IsGISAXS (R. Lazzari [U Paris]), fitGISAXS (D. Baboneau [U Poitiers])

 

SUPPORT LAB

AFM lab

Sample preparation lab

Mechanics labs